Deposition of thin diamond filmsBARDOS, L.Czechoslovak journal of physics. 1992, Vol 42, Num 2, pp 141-150, issn 0011-4626Article

Plasma vitamin A composition and retinol-binding protein concentration during egg formation in laying hensBARDOS, L.International journal for vitamin and nutrition research. 1989, Vol 59, Num 3, pp 251-254, issn 0300-9831Article

Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN filmsBARANKOVA, H; BARDOS, L.Surface & coatings technology. 2011, Vol 205, Num 17-18, pp 4169-4176, issn 0257-8972, 8 p.Article

Cold atmospheric plasma: Sources, processes, and applicationsBARDOS, L; BARANKOVA, H.Thin solid films. 2010, Vol 518, Num 23, pp 6705-6713, issn 0040-6090, 9 p.Article

Effect of post-deposition vacuum annealing on properties of ITO layersLIBRA, M; BARDOS, L.Vacuum. 1988, Vol 38, Num 6, pp 455-457, issn 0042-207XArticle

Axial decaying of the microwave ECR oxygen plasmaBARDOS, L; MUSIL, J.Journal of physics. D, Applied physics (Print). 1988, Vol 21, Num 9, pp 1459-1461, issn 0022-3727Article

High rate jet plasma-assisted chemical vapour depositionBARDOS, L; DUSEK, V.Thin solid films. 1988, Vol 158, Num 2, pp 265-270, issn 0040-6090Conference Paper

Silicon nitride films prepared by PACVD outside the plasmaBARDOS, L; MUSIL, J.Czechoslovak journal of physics. 1985, Vol 35, Num 12, pp 1437-1444, issn 0011-4626Article

COMPARISON OF OXIDES PREPARED IN CW AND PULSE MICROWAVE PLASMAMUSIL J; BARDOS L; HULENYI L et al.1980; PHYS. STATUS SOLIDI (A), APPL. RES.; ISSN 0031-8965; DDR; DA. 1980; VOL. 61; NO 2; PP. 631-634; ABS. RUS; BIBL. 6 REF.Article

Effect of the oxygen absorption on properties of ITO layersBARDOS, L; LIBRA, M.Vacuum. 1989, Vol 39, Num 1, pp 33-36, issn 0042-207XArticle

PLASMA OXIDATION OF SILICON IN A MICROWAVE DISCHARGE AND ITS SPECIFICITYMUSIL J; ZACEK F; BARDOS L et al.1979; J. PHYS. D; GBR; DA. 1979; VOL. 12; NO 5; PP. L61-L63; BIBL. 4 REF.Article

THE NEGATIVE ROLE OF THE FAST ELECTRONS IN THE MICROWAVE OXIDATION OF SILICONBARDOS L; MUSIL J; ZACEK F et al.1978; CZECHOSL. J. PHYS.; CSK; DA. 1978; VOL. 28; NO 6; PP. 639-643; BIBL. 7 REF.Article

Abnormal high rate deposition of TiN films by the radio frequency plasma jet systemBARANKOVA, H; BARDOS, L; BERG, S et al.Journal of the Electrochemical Society. 1995, Vol 142, Num 3, pp 883-887, issn 0013-4651Article

Enhancement of the reactive deposition rate of TiN films at low nitrogen contentBARANKOVA, H; BARDOS, L; BERG, S et al.Journal of the Electrochemical Society. 1994, Vol 141, Num 1, pp L8-L9, issn 0013-4651Article

Some properties of TiN films produced in hollow cathode and microwave ECR hybrid plasma systemGUSTAVSSON, L.-E; BARANKOVA, H; BARDOS, L et al.Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 1464-1468, issn 0257-8972, 5 p.Article

Titanium nitride deposited by high rate rf hollow cathode plasma jet reactive processBARANKOVA, H; BARDOS, L; BERG, S et al.Vacuum. 1995, Vol 46, Num 12, pp 1433-1438, issn 0042-207XArticle

Deposition of carbonaceous films onto internal walls of tubesBARDOS, L; BARANKOVA, H; NYBERG, T et al.Journal of the Electrochemical Society. 1994, Vol 141, Num 2, pp 374-377, issn 0013-4651Article

Radio frequency plasma jet applied to coating of internal walls of narrow tubesBARDOS, L; BERG, S; BARANKOVA, H et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1993, Vol 11, Num 4, pp 1486-1490, issn 0734-2101, 1Conference Paper

Chemiluminescence of the silane-active nitrogen reactions during PECVD of the silicon nitride filmsBARDOS, L; MUSIL, J; LUBANSKI, M et al.Czechoslovak journal of physics. 1984, Vol 34, Num 11, pp 1242-1245, issn 0011-4626Article

A new method for film deposition in the discharge of target metal vapourBARDOS, L; BARANKOVA, H; BERG, S et al.Surface & coatings technology. 1995, Vol 72, Num 3, pp 174-180, issn 0257-8972Article

Superhigh-rate plasma jet etching of siliconBARDOS, L; BERG, S; BLOM, H-O et al.Applied physics letters. 1989, Vol 55, Num 16, pp 1615-1617, issn 0003-6951, 3 p.Article

Probe diagnostics of the planar magnetron discharge = Diagnostiques de sonde d'une décharge de magnétron planeBARDOS, L; LIBRA, M; KRUSTEVA, A. P et al.Czechoslovak journal of physics. 1986, Vol 36, Num 7, pp 883-886, issn 0011-4626Article

Neutral gas flow velocity profiles in the jet plasma-chemical reactorBARDOS, L; STEPANEK, I; KARWASZ, G et al.Vacuum. 1990, Vol 40, Num 5, pp 449-452, issn 0042-207XArticle

The very high-rate plasma-jet dry etching techniqueBARDOS, L; BERG, S; BLOM, H.-O et al.Journal of the Electrochemical Society. 1990, Vol 137, Num 5, pp 1587-1591, issn 0013-4651Article

Thin film processing by radio frequency hollow cathodesBARDOS, L; BARANKOVA, H; BERG, S et al.Surface & coatings technology. 1997, Vol 97, Num 1-3, pp 723-728, issn 0257-8972Conference Paper